Invited Speakers

• Dr. Ilesanmi Adesida. IEEE President , IEEE Fellow, Fellow of American Association for the Advancement of Science (AAAS), and the American Vacuum Society (AVS), USA, “Advances in Gallium Nitride-Based Electronics”(keynote)
• Dr. Si-Chen Lee, President of National Taiwan University, IEEE Fellow, Taiwan “Infrared Plasmonic Thermal Emitter and Its Application in Biological System” (keynote)
• Dr. Peter Wu, President of National Chiao-Tung University, IEEE Fellow, Taiwan, “The  Implementation of Retinal Functions on CMOS  ICs and Their Applications”(keynote)
• Prof. Cary Yang, IEEE Fellow, Santa Clara University, USA, “Electrothermal transport in carbon nanostructures”
• Prof. Peter Yuan, University of Central Florida, USA, “HfO2 CMOS Device and RF Circuit Reliability”
• Dr. K. Ito ,Hitachi, Japan, “Low-Voltage Limitations and Challenges of Nano-Scale CMOS LSIs”
• Dr. Paul Zhou, Analog Devices, USA, “ESD Simulation using Compact Models: from I/O Cell to Full Chip”
• Prof. James Kuo, IEEE Fellow, National Taiwan University, Taiwan, “Modeling the Drain Current Behavior of the Dual-Gate SOI CMOS Devices”
• Dr. Vladislav Vashchenko, National Semiconductor Corp., USA, “ESD Protection Strategy in Power Management Applications”
• Prof. Ru Huang, Peking Uinversity, China, “Investigation of Analog/RF performance and Reliability Behavior of Silicon Nanowire MOSFETs”
• Dr. Wei-Xi Ni, Head of National Nano Device Laboratories, Taiwan, “Anything More Than Size in Nanoelectronics”
• Prof. Mansun Chen, Hong Kong University of Science and Technology, Hong-Kang,“Reduction of Interconnect Loading in Sub-100nm Technology by 3D Stacked-FinCMOS”
• Prof. Hei Wong, City University of Hong Kong, Hong-Kang,“The Current Conduction Issues in High-k Gate Dielectrics”
• Prof. P. K. Chu, IEEE Fellow, City University of Hong Kong, Hong-Kong, “Fabrication of Silicon-on-Insulator Substrates Using Plasma Technologies”
• Prof. Wai-Tung Ng, University of Toronto, Cannda
• Prof. Steve Chung, IEEE Fellow, National Chiao-Tung University, Taiwan “Technology Roadmaps on the Ballistic Transport in Strain Engineered Nanoscale CMOS Devices”
• Prof. Su Yan-kuin, IEEE Fellow, National Cheng-kung University, Taiwan.
• Prof. Jenn-Gwo Hwu , National Taiwan University, Taiwan,“Investigation of Strain-Temperature Stress Effects on the Characteristics of MOS Capacitors with Ultra-thin Gate Oxides”
• Prof. Yuichi Ochiai, Chiba Univ. Japan,“Quantum Transport Devices Application in Multi-Walled Carbon-Nanotubes”